PSST2016- Data used in paper on photoresist removal using an APPJ

Erik Wagenaars (Creator)
Andrew West (Creator)
Marc van der Schans (Creator)
Cigang Xu (Creator)
Mike Cooke (Creator)

Physics

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Metrology concepts for a new generation of plasma manufacturing with atom-scale precision
Gans, T. (Principal investigator), O'Connell, D. (Co-investigator) & Wagenaars, E. (Co-investigator)
EPSRC
1/07/13 → 21/12/18
Project: Research project (funded) › Research