Plasma sources science & technology

ISSNs: 0963-0252

IOP Publishing Ltd.

Scopus rating (2019): CiteScore 6.3 SJR 1.033 SNIP 1.632

Journal

Publications

  1. 2020
  2. 2019
  3. Control of electron dynamics, radical and metastable species generation in atmospheric pressure RF plasma jets by Voltage Waveform Tailoring

    Korolov, I., Donkó, Z., Hübner, G., Bischoff, L., Hartmann, P., Gans, T., Liu, Y., Mussenbrock, T. & Schulze, J., 6 Sep 2019

    Article in Plasma Sources Science and Technology

  4. 2018
  5. Experimental and computational investigations of electron dynamics in micro atmospheric pressure radio-frequency plasma jets operated in He/N2 mixtures

    Bischoff, L., Hübner, G., Korolov, I., Donkó, Z., Hartmann, P., Gans, T., Held, J., Schulz-von der Gathen, V., Liu, Y., Mussenbrock, T. & Schulze, J., 28 Dec 2018

    Article in Plasma sources science & technology

  6. 2017
  7. 2016
  8. Plasma-liquid interactions: a review and roadmap

    Bruggeman, P. J., Kushner, M. J., Locke, B. R., Gardeniers, J. G. E., Graham, W. G., Graves, D. B., Hofmann-Caris, R. C. H. M., Maric, D., Reid, J. P., Ceriani, E., Fernandez Rivas, D., Foster, J. E., Garrick, S. C., Gorbanev, Y., Hamaguchi, S., Iza, F., Jablonowski, H., Klimova, E., Kolb, J., Krcma, F. & 21 others, Lukes, P., Machala, Z., Marinov, I., Mariotti, D., Mededovic Thagard, S., Minakata, D., Neyts, E. C., Pawlat, J., Petrovic, Z. L., Pflieger, R., Reuter, S., Schram, D. C., Schröter, S., Shiraiwa, M., Tarabova, B., Tsai, P. A., Verlet, J. R. R., von Woedtke, T., Wilson, K. R., Yasui, K. & Zvereva, G., 30 Sep 2016

    Article in Plasma sources science & technology

  9. Electron power absorption dynamics in capacitive radio frequency discharges driven by tailored voltage waveforms in CF4

    Brandt, S., Berger, B., Schüngel, E., Korolov, I., Derzsi, A., Bruneau, B., Johnson, E. V., Lafleur, T., O'Connell, D., Koepke, M., Gans, T., Booth, J-P., Donko, Z. & Schulze, J., 29 Jun 2016

    Article in Plasma sources science & technology

  10. Effect of gas properties on the dynamics of the electrical slope asymmetry effect in capacitive plasmas: comparison of Ar, H2 and CF4

    Bruneau, B., Lafleur, T., Gans, T., O'Connell, D., Greb, A., Korolov, I., Derzsi, A., Donko, Z., Brandt, S., Schüngel, E., Schulze, J., Diomede, P., Economou, DJ., Longo, S., Johnson, E. & Booth, J-P., 1 Feb 2016

    Letter in Plasma sources science & technology

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