Atomic layer deposition (ALD) system

Atomic layer deposition (ALD) can produce thin films that are pinhole-free, atomically flat and uniform in thickness. ALD allows better control over thickness, composition and quality than other thin film deposition techniques and thereby adds value to a wide range of research activities at York, as evidenced by the support from 4 departments and an industrial partner. In particular, the ALD system will support ongoing research in optical sensors, 2D Materials, MEMS resonators, solar cells, cellular biology and infrared spectroscopy.

URP Strategic Capital (£196,800.00)