Abstract
Medium-energy ion scattering has been used to determine the atomic structure of two-dimensional yttrium silicide on silicon (111). A full quantitative analysis of the atomic positions of the Si atoms in the top bilayer yields a model similar to that previously suggested in the literature with a Si1-Si2 vertical spacing of 0.80 +/- 0.03 A, but with the Si bilayer relaxed slightly further away from the Y layer (Si2-Y vertical spacing of 1.89 +/- 0.02 A). Observing the effects of the top bilayer vibrations yields a model with significant enhancements. (c) 2005 Elsevier B.V. All rights reserved.
Original language | English |
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Pages (from-to) | 120-127 |
Number of pages | 8 |
Journal | Surface Science |
Volume | 598 |
Issue number | 1-3 |
DOIs | |
Publication status | Published - 20 Dec 2005 |
Keywords
- medium energy ion scattering (MEIS)
- ion-solid interactions,scattering,channeling
- surface relaxation and reconstruction
- surface structure,morphology,roughness, and topography
- metal-semiconductor interfaces
- silicon
- silicides
- yttrium
- RARE-EARTH SILICIDES
- ER SILICIDE
- DYSPROSIUM GERMANIDE
- ELECTRON DIFFRACTION
- SCHOTTKY-BARRIER
- OVERLAYERS
- SI