A medium-energy ion scattering investigation of the structure and surface vibrations of two-dimensional YSi2 grown on Si(111)

T J Wood, C Bonet, T C Q Noakes, P Bailey, S P Tear

Research output: Contribution to journalArticlepeer-review

Abstract

Medium-energy ion scattering has been used to determine the atomic structure of two-dimensional yttrium silicide on silicon (111). A full quantitative analysis of the atomic positions of the Si atoms in the top bilayer yields a model similar to that previously suggested in the literature with a Si1-Si2 vertical spacing of 0.80 +/- 0.03 A, but with the Si bilayer relaxed slightly further away from the Y layer (Si2-Y vertical spacing of 1.89 +/- 0.02 A). Observing the effects of the top bilayer vibrations yields a model with significant enhancements. (c) 2005 Elsevier B.V. All rights reserved.

Original languageEnglish
Pages (from-to)120-127
Number of pages8
JournalSurface Science
Volume598
Issue number1-3
DOIs
Publication statusPublished - 20 Dec 2005

Keywords

  • medium energy ion scattering (MEIS)
  • ion-solid interactions,scattering,channeling
  • surface relaxation and reconstruction
  • surface structure,morphology,roughness, and topography
  • metal-semiconductor interfaces
  • silicon
  • silicides
  • yttrium
  • RARE-EARTH SILICIDES
  • ER SILICIDE
  • DYSPROSIUM GERMANIDE
  • ELECTRON DIFFRACTION
  • SCHOTTKY-BARRIER
  • OVERLAYERS
  • SI

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