Activation volumes in Heusler alloy thin films

J. Sagar, L. R. Fleet, A. Hirohata, K. O'Grady

Research output: Contribution to journalArticlepeer-review


Magnetic measurements and TEM analysis have been carried out in order to investigate the activation volume and its correlation with physical grain size within plasma sputtered Co-2 FeSi thin films. This has led to a new technique for estimating the volumes of ordered and disordered interfacial regions within granular Heusler alloy films. It has been shown that the activation volume has very little grain-size dependence, while the physical grain volume is seen to increase with bias voltage. This suggests that reversal within the films is a domain wall process, and the multistage reversal seen in those films with larger grain sizes is due to pinning of domain walls within the grains.

Original languageEnglish
Article number6027648
Pages (from-to)2440-2443
Number of pages4
JournalIEEE Transactions on Magnetics
Issue number10
Publication statusPublished - Oct 2011

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