Analysis of plasma enhanced pulsed laser deposition of transition metal oxide thin films using medium energy ion scattering

Andrew K. Rossall*, Jaap A. van den Berg, David Meehan, Sudha Rajendiran, Erik Wagenaars

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review


In this study, plasma-enhanced pulsed laser deposition (PE-PLD), which is a novel variant of pulsed laser deposition that combines laser ablation of metal targets with an electrically-produced oxygen plasma background, has been used for the fabrication of ZnO and Cu2O thin films. Samples prepared using the PE-PLD process, with the aim of generating desirable properties for a range of electrical and optical applications, have been analysed using medium energy ion scattering. Using a 100 keV He+ ion beam, high resolution depth profiling of the films was performed with an analysis of the stoichiometry and interface abruptness of these novel materials. It was found that the PE-PLD process can create stoichiometric thin films, the uniformity of which can be controlled by varying the power of the inductively coupled plasma. This technique showed a high deposition rate of ∼0.1 nm s−1.

Original languageEnglish
Pages (from-to)274-278
Number of pages5
JournalNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
Early online date7 Jul 2018
Publication statusPublished - 1 Jul 2019

Bibliographical note

© 2018 Elsevier B.V. All rights reserved. This is an author-produced version of the published paper. Uploaded in accordance with the publisher’s self-archiving policy.


  • Inductively coupled plasma
  • Medium energy ion scattering
  • Nano-layer profiling
  • Plasma-enhanced pulsed laser deposition
  • Thin film
  • Transition metal oxide

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