TY - JOUR
T1 - Anisotropy constant of antiferromagnetic Pt50Mn50
AU - Frost, William James
AU - Carpenter, Robert
AU - Vallejo Fernandez, Gonzalo
N1 - © 2024 The Author(s)
PY - 2024/2/13
Y1 - 2024/2/13
N2 - We have measured the anisotropy constant of polycrystalline PtMn thin films deposited on different seed layer materials: Pt, Ru and Nb. Values as high as 2.5x10^7 erg/cc were achieved for samples deposited on Pt. The films can be crystallised into the antiferromagnetic, face-centred-tetragonal phase on Ru and Pt seed layers at annealing temperatures compatible with back-end-of-line conditions of up to 400C for one to three hours. Additionally these antiferromagnetic layers, 8 nm thick, are highly thermally stable with median blocking temperatures above 200C. The effect of diffusion on the stoichiometry of the PtMn layers is discussed with regards to the different seed layer materials.
AB - We have measured the anisotropy constant of polycrystalline PtMn thin films deposited on different seed layer materials: Pt, Ru and Nb. Values as high as 2.5x10^7 erg/cc were achieved for samples deposited on Pt. The films can be crystallised into the antiferromagnetic, face-centred-tetragonal phase on Ru and Pt seed layers at annealing temperatures compatible with back-end-of-line conditions of up to 400C for one to three hours. Additionally these antiferromagnetic layers, 8 nm thick, are highly thermally stable with median blocking temperatures above 200C. The effect of diffusion on the stoichiometry of the PtMn layers is discussed with regards to the different seed layer materials.
U2 - 10.1088/1361-6463/ad2564
DO - 10.1088/1361-6463/ad2564
M3 - Article
SN - 1361-6463
VL - 57
JO - Journal of Physics D: Applied Physics
JF - Journal of Physics D: Applied Physics
M1 - 185003
ER -