Original language | English |
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Pages (from-to) | 1524-1525 |
Number of pages | 2 |
Journal | Microscopy and Microanalysis |
Volume | 22 |
Issue number | S3 |
Early online date | 25 Jul 2016 |
DOIs | |
Publication status | Published - 2016 |
Atomic and electronic structure study of a Co 2 FeAl 0.5 Si 0.5 half-metal thin film on Si(111)
Demie Kepaptsoglou, Barat Kuerbanjiang, Zlatko Nedelkoski, Arsham Ghasemi, Shinya Yamada, Kohei Hamaya, Atsufumi Hirohata, QuentinM. Ramasse, Vlado K. Lazarov
Research output: Contribution to journal › Article › peer-review