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Atomic-level structural and chemical analysis of Cr-doped Bi2Se3 thin films

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Author(s)

  • A Ghasemi
  • D Kepaptsoglou
  • L J Collins-McIntyre
  • Q Ramasse
  • T Hesjedal
  • V K Lazarov

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Publication details

JournalScientific Reports
DateAccepted/In press - 4 May 2016
DatePublished (current) - 25 May 2016
Volume6
Number of pages5
Original languageEnglish

Abstract

We present a study of the structure and chemical composition of the Cr-doped 3D topological insulator Bi2Se3. Single-crystalline thin films were grown by molecular beam epitaxy on Al2O3 (0001), and their structural and chemical properties determined on an atomic level by aberration-corrected scanning transmission electron microscopy and electron energy loss spectroscopy. A regular quintuple layer stacking of the Bi2Se3 film is found, with the exception of the first several atomic layers in the initial growth. The spectroscopy data gives direct evidence that Cr is preferentially substituting for Bi in the Bi2Se3 host. We also show that Cr has a tendency to segregate at internal grain boundaries of the Bi2Se3 film.

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