C-shaped electron beams: design, experimental production and application

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The development of metamaterials operating at visible light wavelengths requires metamaterials to be produced with nanoscale structure over large areas. Improvements in the efficiency of electron beam lithography (EBL) could play an important role in accelerating this development. In this paper we show the production of a shaped probe for use in EBL. A phase structured electron wave containing vortices can be focused to produce a C-shaped cross section. Local spatial frequency analysis shows that both the gap and overall size of the C-shape can be easily controlled. We present the generation of such a C-shaped electron beam using a holographic binary amplitude diffraction mask. Thin AlF3 film is exposed to the C-shaped diffraction order and demonstrates the facile production of both a metallic C-shaped structure as well as the etching of a C-shaped hole.© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Original languageEnglish
Title of host publicationLaser Beam Shaping XVI
EditorsAndrew Forbes, Todd E. Lizotte
Place of PublicationCalifornia, United States
PublisherSPIE
Volume9581
ISBN (Print)0277-786X
DOIs
Publication statusPublished - 2015
  • ICOAM 2015

    Jun Yuan (Speaker)

    4 Aug 20157 Aug 2015

    Activity: Participating in or organising an eventConference participation

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