Diagnostics for the dynamics of power dissipation in technologically used plasmas

T. Gans; D. O'Connell; J. Schulze; V. A. Kadetov; U. Czarnetzki

Diagnostics for the dynamics of power dissipation in technologically used plasmas

T. Gans, D. O'Connell, J. Schulze, V. A. Kadetov, U. Czarnetzki

Physics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Radio frequency (rf) discharges are widely used for technological applications. Despite this, power dissipation mechanisms in these discharges are not yet fully understood. The limited understanding is mainly caused by the complexity of underlying phenomena and very restricted experimental access. Recent advances in phase resolved optical emission spectroscopy (PROES) in combination with adequate modeling of the population dynamics of excited states allow deeper insight into underlying fundamental processes. This paper discusses the application of PROES in a variety of rf-discharges, such as: capacitively coupled plasmas (CCP), dualfrequency CCP (2f-CCP), inductively coupled plasmas (ICP), and magnetic neutral loop discharges (NLD).

Original language	English
Title of host publication	Physics of Ionized Gases
Editors	L Hadzievski, BP Marinkovic, NS Simonovic
Place of Publication	MELVILLE
Publisher	American Institute of Physics
Pages	260-271
Number of pages	12
ISBN (Print)	978-0-7354-0377-2
Publication status	Published - 2006

Keywords

low-temperature plasmas
radio-frequency discharges
power dissipation
plasma ionization
electron dynamics
electron heating
plasma diagnostics
phase resolved optical emission spectroscopy (PROES)
ROTATIONAL STATE POPULATIONS
FUNCTIONAL SEPARATION
COUPLED PLASMA
FREQUENCY
DISCHARGES
EXCITATION
ENERGY
MODEL

Cite this

@inproceedings{03c3dd0aecc64734ac5b795d04f3cb4f,

title = "Diagnostics for the dynamics of power dissipation in technologically used plasmas",

abstract = "Radio frequency (rf) discharges are widely used for technological applications. Despite this, power dissipation mechanisms in these discharges are not yet fully understood. The limited understanding is mainly caused by the complexity of underlying phenomena and very restricted experimental access. Recent advances in phase resolved optical emission spectroscopy (PROES) in combination with adequate modeling of the population dynamics of excited states allow deeper insight into underlying fundamental processes. This paper discusses the application of PROES in a variety of rf-discharges, such as: capacitively coupled plasmas (CCP), dualfrequency CCP (2f-CCP), inductively coupled plasmas (ICP), and magnetic neutral loop discharges (NLD).",

keywords = "low-temperature plasmas, radio-frequency discharges, power dissipation, plasma ionization, electron dynamics, electron heating, plasma diagnostics, phase resolved optical emission spectroscopy (PROES), ROTATIONAL STATE POPULATIONS, FUNCTIONAL SEPARATION, COUPLED PLASMA, FREQUENCY, DISCHARGES, EXCITATION, ENERGY, MODEL",

author = "T. Gans and D. O'Connell and J. Schulze and Kadetov, {V. A.} and U. Czarnetzki",

year = "2006",

language = "English",

isbn = "978-0-7354-0377-2",

pages = "260--271",

editor = "L Hadzievski and BP Marinkovic and NS Simonovic",

booktitle = "Physics of Ionized Gases",

publisher = "American Institute of Physics",

address = "United States",

}

TY - GEN

T1 - Diagnostics for the dynamics of power dissipation in technologically used plasmas

AU - Gans, T.

AU - O'Connell, D.

AU - Schulze, J.

AU - Kadetov, V. A.

AU - Czarnetzki, U.

PY - 2006

Y1 - 2006

N2 - Radio frequency (rf) discharges are widely used for technological applications. Despite this, power dissipation mechanisms in these discharges are not yet fully understood. The limited understanding is mainly caused by the complexity of underlying phenomena and very restricted experimental access. Recent advances in phase resolved optical emission spectroscopy (PROES) in combination with adequate modeling of the population dynamics of excited states allow deeper insight into underlying fundamental processes. This paper discusses the application of PROES in a variety of rf-discharges, such as: capacitively coupled plasmas (CCP), dualfrequency CCP (2f-CCP), inductively coupled plasmas (ICP), and magnetic neutral loop discharges (NLD).

AB - Radio frequency (rf) discharges are widely used for technological applications. Despite this, power dissipation mechanisms in these discharges are not yet fully understood. The limited understanding is mainly caused by the complexity of underlying phenomena and very restricted experimental access. Recent advances in phase resolved optical emission spectroscopy (PROES) in combination with adequate modeling of the population dynamics of excited states allow deeper insight into underlying fundamental processes. This paper discusses the application of PROES in a variety of rf-discharges, such as: capacitively coupled plasmas (CCP), dualfrequency CCP (2f-CCP), inductively coupled plasmas (ICP), and magnetic neutral loop discharges (NLD).

KW - low-temperature plasmas

KW - radio-frequency discharges

KW - power dissipation

KW - plasma ionization

KW - electron dynamics

KW - electron heating

KW - plasma diagnostics

KW - phase resolved optical emission spectroscopy (PROES)

KW - ROTATIONAL STATE POPULATIONS

KW - FUNCTIONAL SEPARATION

KW - COUPLED PLASMA

KW - FREQUENCY

KW - DISCHARGES

KW - EXCITATION

KW - ENERGY

KW - MODEL

M3 - Conference contribution

SN - 978-0-7354-0377-2

SP - 260

EP - 271

BT - Physics of Ionized Gases

A2 - Hadzievski, L

A2 - Marinkovic, BP

A2 - Simonovic, NS

PB - American Institute of Physics

CY - MELVILLE

ER -