Effect of annealing on the structure and magnetic properties of Co2FeAl0.5Si0.5 thin films on Ge(111)

Balati Kuerbanjiang, Christopher Love, Demie Kepaptsoglou, Zlatko Nedelkoski, Shinya Yamada, Arsham Ghasemi, Quentin M Ramasse, Kohei Hamaya, Stuart A. Cavill, Vlado K. Lazarov

Research output: Contribution to journalArticlepeer-review

Abstract

Abstract We present a magnetic and structural properties study of epitaxially grown B2-ordered full Heusler Co2FeSi0.5Al0.5 single crystal films on Ge(111) substrates, as a function of annealing temperature. Hysteresis loop measurements reveal that the magnetic properties of Co2FeSi0.5Al0.5 are stable up to 450 °C while ferromagnetic resonance linewidth measurements show a reduction of Gilbert damping from 5.6 × 10−3 to 2.9 × 10−3 for as-grown and annealed film, respectively. Above 500 °C, the films have increased coercivity, decreased saturation magnetisation, and show characteristic two-magnon scattering resonance line-shapes. Magnetic inhomogeneities developed within the film when annealed above 500 °C were correlated to significant interdiffusion at the film-substrate interface, as confirmed by scanning transmission electron microscopy and electron energy loss spectroscopy. By performing first-principles calculations based on atomistic models developed from atomically-resolved microscopy images, we show the magnetic moment of the Co2FeSi0.5Al0.5 film reduces upon Co substitution by Ge atoms.
Original languageEnglish
Number of pages9
JournalJOURNAL OF ALLOYS AND COMPOUNDS
Early online date7 Mar 2018
DOIs
Publication statusE-pub ahead of print - 7 Mar 2018

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