Electron dynamics and frequency coupling in a radio-frequency capacitively biased planar coil inductively coupled plasma system

M. Zaka-ul-Islam, Deborah O'Connell, William G Graham, Timo Gans

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The electron dynamics in a planar coil inductively coupled plasma (ICP) system with a capacitively biased electrode is investigated using space and phase resolved optical emission spectroscopy. The two power source frequencies are exact multiple of each other and phase-locked. In this configuration, the system is investigated when the coil is operated in both E-mode and H-mode. The results show that in a phase synchronized RF biased ICP, the electrode bias power couples with the capacitive contribution of the coil, in both E-mode and H-modes, similar to dual-frequency capacitively coupled plasmas (2f-CCPs). It is also demonstrated that in H-mode, the phase between the electrode bias frequency and the ICP coil frequency influences the electron heating, similar to the electrical asymmetry effect in 2f-CCPs.
Original languageEnglish
Article number044007
JournalPlasma sources science & technology
Publication statusPublished - 15 Jul 2015

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