Electron dynamics and frequency coupling in a radio-frequency capacitively biased planar coil inductively coupled plasma system

M. Zaka-ul-Islam; Deborah O'Connell; William G Graham; Timo Gans

doi:10.1088/0963-0252/24/4/044007

Electron dynamics and frequency coupling in a radio-frequency capacitively biased planar coil inductively coupled plasma system

M. Zaka-ul-Islam, Deborah O'Connell, William G Graham, Timo Gans

Physics

Research output: Contribution to journal › Article › peer-review

Abstract

The electron dynamics in a planar coil inductively coupled plasma (ICP) system with a capacitively biased electrode is investigated using space and phase resolved optical emission spectroscopy. The two power source frequencies are exact multiple of each other and phase-locked. In this configuration, the system is investigated when the coil is operated in both E-mode and H-mode. The results show that in a phase synchronized RF biased ICP, the electrode bias power couples with the capacitive contribution of the coil, in both E-mode and H-modes, similar to dual-frequency capacitively coupled plasmas (2f-CCPs). It is also demonstrated that in H-mode, the phase between the electrode bias frequency and the ICP coil frequency influences the electron heating, similar to the electrical asymmetry effect in 2f-CCPs.

Original language	English
Article number	044007
Journal	Plasma sources science & technology
Volume	24
DOIs	https://doi.org/10.1088/0963-0252/24/4/044007
Publication status	Published - 15 Jul 2015

Access to Document

10.1088/0963-0252/24/4/044007

http://iopscience.iop.org/0963-0252/24/4/044007/article

Cite this

@article{d07d732c735c4c55874ef5d4721ea7b1,

title = "Electron dynamics and frequency coupling in a radio-frequency capacitively biased planar coil inductively coupled plasma system",

abstract = "The electron dynamics in a planar coil inductively coupled plasma (ICP) system with a capacitively biased electrode is investigated using space and phase resolved optical emission spectroscopy. The two power source frequencies are exact multiple of each other and phase-locked. In this configuration, the system is investigated when the coil is operated in both E-mode and H-mode. The results show that in a phase synchronized RF biased ICP, the electrode bias power couples with the capacitive contribution of the coil, in both E-mode and H-modes, similar to dual-frequency capacitively coupled plasmas (2f-CCPs). It is also demonstrated that in H-mode, the phase between the electrode bias frequency and the ICP coil frequency influences the electron heating, similar to the electrical asymmetry effect in 2f-CCPs.",

author = "M. Zaka-ul-Islam and Deborah O'Connell and Graham, {William G} and Timo Gans",

year = "2015",

month = jul,

day = "15",

doi = "10.1088/0963-0252/24/4/044007",

language = "English",

volume = "24",

journal = "Plasma sources science & technology",

issn = "0963-0252",

publisher = "IOP Publishing",

}

TY - JOUR

T1 - Electron dynamics and frequency coupling in a radio-frequency capacitively biased planar coil inductively coupled plasma system

AU - Zaka-ul-Islam, M.

AU - O'Connell, Deborah

AU - Graham, William G

AU - Gans, Timo

PY - 2015/7/15

Y1 - 2015/7/15

N2 - The electron dynamics in a planar coil inductively coupled plasma (ICP) system with a capacitively biased electrode is investigated using space and phase resolved optical emission spectroscopy. The two power source frequencies are exact multiple of each other and phase-locked. In this configuration, the system is investigated when the coil is operated in both E-mode and H-mode. The results show that in a phase synchronized RF biased ICP, the electrode bias power couples with the capacitive contribution of the coil, in both E-mode and H-modes, similar to dual-frequency capacitively coupled plasmas (2f-CCPs). It is also demonstrated that in H-mode, the phase between the electrode bias frequency and the ICP coil frequency influences the electron heating, similar to the electrical asymmetry effect in 2f-CCPs.

AB - The electron dynamics in a planar coil inductively coupled plasma (ICP) system with a capacitively biased electrode is investigated using space and phase resolved optical emission spectroscopy. The two power source frequencies are exact multiple of each other and phase-locked. In this configuration, the system is investigated when the coil is operated in both E-mode and H-mode. The results show that in a phase synchronized RF biased ICP, the electrode bias power couples with the capacitive contribution of the coil, in both E-mode and H-modes, similar to dual-frequency capacitively coupled plasmas (2f-CCPs). It is also demonstrated that in H-mode, the phase between the electrode bias frequency and the ICP coil frequency influences the electron heating, similar to the electrical asymmetry effect in 2f-CCPs.

U2 - 10.1088/0963-0252/24/4/044007

DO - 10.1088/0963-0252/24/4/044007

M3 - Article

SN - 0963-0252

VL - 24

JO - Plasma sources science & technology

JF - Plasma sources science & technology

M1 - 044007

ER -