Evidence of Magnetostrictive Effects on STT-MRAM Performance by Atomistic and Spin Modeling

K. Sankaran, J. Swerts, R. Carpenter, S. Couet, K. Garello, R. F.L. Evans, S. Rao, W. Kim, S. Kundu, D. Crotti, G. S. Kar, G. Pourtois

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

For the first time, we demonstrate, using an atomistic description of a 30nm diameter spin-transfer-torque magnetic random access memories (STT-MRAM), that the difference in mechanical properties of its sub-nanometer layers induces a high compressive strain in the magnetic tunnel junction (MTJ) and leads to a detrimental magnetostrictive effect. Our model explains the issues met in engineering the electrical and magnetic performances in scaled STT-MRAM devices. The resulting high compressive strain built in the stack, particularly in the MgO tunnel barrier (t-MgO), and its associated non-uniform atomic displacements, impacts on the quality of the MTJ interface and leads to strain relieve mechanisms such as surface roughness and adhesion issues. We illustrate that the strain gradient induced by the different materials and their thicknesses in the stacks has a negative impact on the tunnel magneto-resistance (TMR), on the magnetic nucleation process and on the STT-MRAM performance.

Original languageEnglish
Title of host publication2018 IEEE International Electron Devices Meeting, IEDM 2018
PublisherIEEE
Pages40.5.1-40.5.4
Number of pages4
Volume2018-December
ISBN (Electronic)9781728119878
DOIs
Publication statusPublished - 16 Jan 2019
Event64th Annual IEEE International Electron Devices Meeting, IEDM 2018 - San Francisco, United States
Duration: 1 Dec 20185 Dec 2018

Conference

Conference64th Annual IEEE International Electron Devices Meeting, IEDM 2018
Country/TerritoryUnited States
CitySan Francisco
Period1/12/185/12/18

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