Extreme ultraviolet plasma source for future lithography

Erik Wagenaars, A Mader, K Bergmann, Jeroen Jonkers, Willi Neff

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	1280
Number of pages	2
Journal	IEEE transactions on plasma science
Volume	36
Issue number	4 PART 1
Publication status	Published - Aug 2008

Cite this

@article{b52a886abd734de490ead4c69432d4c8,

title = "Extreme ultraviolet plasma source for future lithography",

author = "Erik Wagenaars and A Mader and K Bergmann and Jeroen Jonkers and Willi Neff",

year = "2008",

month = aug,

language = "English",

volume = "36",

pages = "1280",

journal = "IEEE transactions on plasma science",

issn = "0093-3813",

publisher = "IEEE",

number = "4 PART 1",

}

TY - JOUR

T1 - Extreme ultraviolet plasma source for future lithography

AU - Wagenaars, Erik

AU - Mader, A

AU - Bergmann, K

AU - Jonkers, Jeroen

AU - Neff, Willi

PY - 2008/8

Y1 - 2008/8

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M3 - Article

SN - 0093-3813

VL - 36

SP - 1280

JO - IEEE transactions on plasma science

JF - IEEE transactions on plasma science

IS - 4 PART 1

ER -