Frequency coupling in dual frequency capacitively coupled radio-frequency plasmas

T. Gans; J. Schulze; D. O'Connell; U. Czarnetzki; R. Faulkner; A. R. Ellingboe; M. M. Turner

doi:10.1063/1.2425044

Frequency coupling in dual frequency capacitively coupled radio-frequency plasmas

T. Gans, J. Schulze, D. O'Connell, U. Czarnetzki, R. Faulkner, A. R. Ellingboe, M. M. Turner

Physics

Research output: Contribution to journal › Article › peer-review

Abstract

An industrial, confined, dual frequency, capacitively coupled, radio-frequency plasma etch reactor (Exelan (R), Lam Research) has been modified for spatially resolved optical measurements. Space and phase resolved optical emission spectroscopy yields insight into the dynamics of the discharge. A strong coupling of the two frequencies is observed in the emission profiles. Consequently, the ionization dynamics, probed through excitation, is determined by both frequencies. The control of plasma density by the high frequency is, therefore, also influenced by the low frequency. Hence, separate control of plasma density and ion energy is rather complex. (c) 2006 American Institute of Physics.

Original language	English
Article number	261502
Number of pages	3
Journal	Applied Physics Letters
Volume	89
Issue number	26
DOIs	https://doi.org/10.1063/1.2425044
Publication status	Published - 25 Dec 2006

Keywords

FUNCTIONAL SEPARATION
DISCHARGES
ENERGY
MODEL

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10.1063/1.2425044

Cite this

@article{f49713a712ee48ef836de724885fa21a,

title = "Frequency coupling in dual frequency capacitively coupled radio-frequency plasmas",

abstract = "An industrial, confined, dual frequency, capacitively coupled, radio-frequency plasma etch reactor (Exelan (R), Lam Research) has been modified for spatially resolved optical measurements. Space and phase resolved optical emission spectroscopy yields insight into the dynamics of the discharge. A strong coupling of the two frequencies is observed in the emission profiles. Consequently, the ionization dynamics, probed through excitation, is determined by both frequencies. The control of plasma density by the high frequency is, therefore, also influenced by the low frequency. Hence, separate control of plasma density and ion energy is rather complex. (c) 2006 American Institute of Physics.",

keywords = "FUNCTIONAL SEPARATION, DISCHARGES, ENERGY, MODEL",

author = "T. Gans and J. Schulze and D. O'Connell and U. Czarnetzki and R. Faulkner and Ellingboe, {A. R.} and Turner, {M. M.}",

year = "2006",

month = dec,

day = "25",

doi = "10.1063/1.2425044",

language = "English",

volume = "89",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

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TY - JOUR

T1 - Frequency coupling in dual frequency capacitively coupled radio-frequency plasmas

AU - Gans, T.

AU - Schulze, J.

AU - O'Connell, D.

AU - Czarnetzki, U.

AU - Faulkner, R.

AU - Ellingboe, A. R.

AU - Turner, M. M.

PY - 2006/12/25

Y1 - 2006/12/25

N2 - An industrial, confined, dual frequency, capacitively coupled, radio-frequency plasma etch reactor (Exelan (R), Lam Research) has been modified for spatially resolved optical measurements. Space and phase resolved optical emission spectroscopy yields insight into the dynamics of the discharge. A strong coupling of the two frequencies is observed in the emission profiles. Consequently, the ionization dynamics, probed through excitation, is determined by both frequencies. The control of plasma density by the high frequency is, therefore, also influenced by the low frequency. Hence, separate control of plasma density and ion energy is rather complex. (c) 2006 American Institute of Physics.

AB - An industrial, confined, dual frequency, capacitively coupled, radio-frequency plasma etch reactor (Exelan (R), Lam Research) has been modified for spatially resolved optical measurements. Space and phase resolved optical emission spectroscopy yields insight into the dynamics of the discharge. A strong coupling of the two frequencies is observed in the emission profiles. Consequently, the ionization dynamics, probed through excitation, is determined by both frequencies. The control of plasma density by the high frequency is, therefore, also influenced by the low frequency. Hence, separate control of plasma density and ion energy is rather complex. (c) 2006 American Institute of Physics.

KW - FUNCTIONAL SEPARATION

KW - DISCHARGES

KW - ENERGY

KW - MODEL

U2 - 10.1063/1.2425044

DO - 10.1063/1.2425044

M3 - Article

SN - 0003-6951

VL - 89

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 26

M1 - 261502

ER -