TY - JOUR
T1 - Growth and Characterisation of Antiferromagnetic Ni2MnAl Heusler Alloy Films
AU - Huminiuc, Teodor
AU - Whear, Oliver
AU - Vick, Andrew James
AU - Lloyd, David
AU - Vallejo Fernandez, Gonzalo
AU - O'Grady, Kevin Dermot
AU - Hirohata, Atsufumi
N1 - © 2021, The Author(s).
PY - 2021/9/13
Y1 - 2021/9/13
N2 - Recent rapid advancement in antiferromagnetic spintronics paves a new path for efficient computing with THz operation. To date, major studies have been performed with conventional metallic, e.g., Ir-Mn and Pt-Mn, and semiconducting, e.g., CuMnAs, antiferromagnets, which may suffer from their elemental criticality and high resistivity. In order to resolve these obstacles, new antiferromagnetic films are under intense development for device operation above room temperature. Here, we report the structural and magnetic properties of an antiferromagnetic Ni2MnAl Heulser alloy with and without Fe and Co doping in thin film form, which has significant potential for device applications.
AB - Recent rapid advancement in antiferromagnetic spintronics paves a new path for efficient computing with THz operation. To date, major studies have been performed with conventional metallic, e.g., Ir-Mn and Pt-Mn, and semiconducting, e.g., CuMnAs, antiferromagnets, which may suffer from their elemental criticality and high resistivity. In order to resolve these obstacles, new antiferromagnetic films are under intense development for device operation above room temperature. Here, we report the structural and magnetic properties of an antiferromagnetic Ni2MnAl Heulser alloy with and without Fe and Co doping in thin film form, which has significant potential for device applications.
U2 - 10.3390/magnetochemistry7090127
DO - 10.3390/magnetochemistry7090127
M3 - Article
SN - 2312-7481
VL - 7
JO - Magnetochemistry
JF - Magnetochemistry
IS - 9
M1 - 127
ER -