High-Q photonic crystal cavities realised using deep ultraviolet lithography

K. Welna; K. Debnath; T. F. Krauss; L. O'Faolain

doi:10.1049/el.2015.1120

High-Q photonic crystal cavities realised using deep ultraviolet lithography

K. Welna^*, K. Debnath, T. F. Krauss, L. O'Faolain

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

Abstract

Deep-ultraviolet lithography is essential for the mass production of silicon devices. To date, restrictions in the process have prevented the realisation of high-Q-factor optical resonators. This reported work demonstrates photonic crystal cavities with Q-factor values of ∼200 000 using an optimised design.

Original language	English
Pages (from-to)	1277-1279
Number of pages	3
Journal	Electronics Letters
Volume	51
Issue number	16
DOIs	https://doi.org/10.1049/el.2015.1120
Publication status	Published - 1 Jan 2015

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10.1049/el.2015.1120

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title = "High-Q photonic crystal cavities realised using deep ultraviolet lithography",

abstract = "Deep-ultraviolet lithography is essential for the mass production of silicon devices. To date, restrictions in the process have prevented the realisation of high-Q-factor optical resonators. This reported work demonstrates photonic crystal cavities with Q-factor values of ∼200 000 using an optimised design.",

author = "K. Welna and K. Debnath and Krauss, {T. F.} and L. O'Faolain",

year = "2015",

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doi = "10.1049/el.2015.1120",

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AU - Welna, K.

AU - Debnath, K.

AU - Krauss, T. F.

AU - O'Faolain, L.

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Y1 - 2015/1/1

N2 - Deep-ultraviolet lithography is essential for the mass production of silicon devices. To date, restrictions in the process have prevented the realisation of high-Q-factor optical resonators. This reported work demonstrates photonic crystal cavities with Q-factor values of ∼200 000 using an optimised design.

AB - Deep-ultraviolet lithography is essential for the mass production of silicon devices. To date, restrictions in the process have prevented the realisation of high-Q-factor optical resonators. This reported work demonstrates photonic crystal cavities with Q-factor values of ∼200 000 using an optimised design.

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DO - 10.1049/el.2015.1120

M3 - Article

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VL - 51

SP - 1277

EP - 1279

JO - Electronics Letters

JF - Electronics Letters

IS - 16

ER -

High-Q photonic crystal cavities realised using deep ultraviolet lithography

Abstract

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