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High speed e-beam writing for large area photonic nanostructures-a choice of parameters

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High speed e-beam writing for large area photonic nanostructures-a choice of parameters. / Li, Kezheng; Li, Juntao; Reardon, Christopher; Schuster, Christian S.; Wang, Yue; Triggs, Graham J.; Damnik, Niklas; Muënchenberger, Jana; Wang, Xuehua; Martins, Emiliano R.; Krauss, Thomas F.

In: Scientific Reports, Vol. 6, 32945, 16.09.2016.

Research output: Contribution to journalArticle

Harvard

Li, K, Li, J, Reardon, C, Schuster, CS, Wang, Y, Triggs, GJ, Damnik, N, Muënchenberger, J, Wang, X, Martins, ER & Krauss, TF 2016, 'High speed e-beam writing for large area photonic nanostructures-a choice of parameters', Scientific Reports, vol. 6, 32945. https://doi.org/10.1038/srep32945

APA

Li, K., Li, J., Reardon, C., Schuster, C. S., Wang, Y., Triggs, G. J., ... Krauss, T. F. (2016). High speed e-beam writing for large area photonic nanostructures-a choice of parameters. Scientific Reports, 6, [32945]. https://doi.org/10.1038/srep32945

Vancouver

Li K, Li J, Reardon C, Schuster CS, Wang Y, Triggs GJ et al. High speed e-beam writing for large area photonic nanostructures-a choice of parameters. Scientific Reports. 2016 Sep 16;6. 32945. https://doi.org/10.1038/srep32945

Author

Li, Kezheng ; Li, Juntao ; Reardon, Christopher ; Schuster, Christian S. ; Wang, Yue ; Triggs, Graham J. ; Damnik, Niklas ; Muënchenberger, Jana ; Wang, Xuehua ; Martins, Emiliano R. ; Krauss, Thomas F. / High speed e-beam writing for large area photonic nanostructures-a choice of parameters. In: Scientific Reports. 2016 ; Vol. 6.

Bibtex - Download

@article{7bcf072c373a4fbb9381675a2c45e2eb,
title = "High speed e-beam writing for large area photonic nanostructures-a choice of parameters",
abstract = "Photonic nanostructures are used for many optical systems and applications. However, some high-end applications require the use of electron-beam lithography (EBL) to generate such nanostructures. An important technological bottleneck is the exposure time of the EBL systems, which can exceed 24 hours per 1 cm2. Here, we have developed a method based on a target function to systematically increase the writing speed of EBL. As an example, we use as the target function the fidelity of the Fourier Transform spectra of nanostructures that are designed for thin film light trapping applications, and optimize the full parameter space of the lithography process. Finally, we are able to reduce the exposure time by a factor of 5.5 without loss of photonic performance. We show that the performances of the fastest written structures are identical to the original ones within experimental error. As the target function can be varied according to different purposes, the method is also applicable to guided mode resonant grating and many other areas. These findings contribute to the advancement of EBL and point towards making the technology more attractive for commercial applications.",
author = "Kezheng Li and Juntao Li and Christopher Reardon and Schuster, {Christian S.} and Yue Wang and Triggs, {Graham J.} and Niklas Damnik and Jana Mu{\"e}nchenberger and Xuehua Wang and Martins, {Emiliano R.} and Krauss, {Thomas F.}",
note = "{\circledC} The Author(s) 2016",
year = "2016",
month = "9",
day = "16",
doi = "10.1038/srep32945",
language = "English",
volume = "6",
journal = "Scientific Reports",
issn = "2045-2322",
publisher = "Springer Nature",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - High speed e-beam writing for large area photonic nanostructures-a choice of parameters

AU - Li, Kezheng

AU - Li, Juntao

AU - Reardon, Christopher

AU - Schuster, Christian S.

AU - Wang, Yue

AU - Triggs, Graham J.

AU - Damnik, Niklas

AU - Muënchenberger, Jana

AU - Wang, Xuehua

AU - Martins, Emiliano R.

AU - Krauss, Thomas F.

N1 - © The Author(s) 2016

PY - 2016/9/16

Y1 - 2016/9/16

N2 - Photonic nanostructures are used for many optical systems and applications. However, some high-end applications require the use of electron-beam lithography (EBL) to generate such nanostructures. An important technological bottleneck is the exposure time of the EBL systems, which can exceed 24 hours per 1 cm2. Here, we have developed a method based on a target function to systematically increase the writing speed of EBL. As an example, we use as the target function the fidelity of the Fourier Transform spectra of nanostructures that are designed for thin film light trapping applications, and optimize the full parameter space of the lithography process. Finally, we are able to reduce the exposure time by a factor of 5.5 without loss of photonic performance. We show that the performances of the fastest written structures are identical to the original ones within experimental error. As the target function can be varied according to different purposes, the method is also applicable to guided mode resonant grating and many other areas. These findings contribute to the advancement of EBL and point towards making the technology more attractive for commercial applications.

AB - Photonic nanostructures are used for many optical systems and applications. However, some high-end applications require the use of electron-beam lithography (EBL) to generate such nanostructures. An important technological bottleneck is the exposure time of the EBL systems, which can exceed 24 hours per 1 cm2. Here, we have developed a method based on a target function to systematically increase the writing speed of EBL. As an example, we use as the target function the fidelity of the Fourier Transform spectra of nanostructures that are designed for thin film light trapping applications, and optimize the full parameter space of the lithography process. Finally, we are able to reduce the exposure time by a factor of 5.5 without loss of photonic performance. We show that the performances of the fastest written structures are identical to the original ones within experimental error. As the target function can be varied according to different purposes, the method is also applicable to guided mode resonant grating and many other areas. These findings contribute to the advancement of EBL and point towards making the technology more attractive for commercial applications.

UR - http://www.scopus.com/inward/record.url?scp=84988349458&partnerID=8YFLogxK

U2 - 10.1038/srep32945

DO - 10.1038/srep32945

M3 - Article

VL - 6

JO - Scientific Reports

JF - Scientific Reports

SN - 2045-2322

M1 - 32945

ER -