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High-Q photonic crystal cavities realised using deep ultraviolet lithography

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JournalElectronics Letters
DatePublished - 1 Jan 2015
Issue number16
Volume51
Number of pages3
Pages (from-to)1277-1279
Original languageEnglish

Abstract

Deep-ultraviolet lithography is essential for the mass production of silicon devices. To date, restrictions in the process have prevented the realisation of high-Q-factor optical resonators. This reported work demonstrates photonic crystal cavities with Q-factor values of ∼200 000 using an optimised design.

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