Identification of artefacts due to surface topography in Auger analysis

A Gelsthorpe; M M El-Gomati

Identification of artefacts due to surface topography in Auger analysis

Electronic Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Artefacts due to surface topography are a common problem in Auger analysis. A Cylindrical Mirror Analyser (CMA) has been modified to aid the rapid identification of such artefacts. It uses three pairs of opposing detectors that observe 6 angles of azimuth simultaneously. The CMA also incorporates a new electrostatic lens between the cylinders and detector, which deflects electrons onto the detectors along the same path independent of their energy. The operation and characterisation of the modified CMA and the lens are described. Data from a microfabricated field electron emitter show the ability to identify artefacts from the true surface data.

Original language	English
Title of host publication	ELECTRON MICROSCOPY AND ANALYSIS 2001
Editors	M Aindow, CJ Kiely
Place of Publication	BRISTOL
Publisher	IOP Publishing
Pages	69-72
Number of pages	4
ISBN (Print)	0-7503-0812-5
Publication status	Published - 2001
Event	Conference of the Electron-Microscopy-and Analysis-Group - DUNDEE Duration: 5 Sept 2001 → 7 Sept 2001

Conference

Conference	Conference of the Electron-Microscopy-and Analysis-Group
City	DUNDEE
Period	5/09/01 → 7/09/01

Keywords

Auger
CMA
electrostatic lens
topography
artefact identification

Cite this

@inproceedings{1fec0cef02f7429bbeb68206056a491d,

title = "Identification of artefacts due to surface topography in Auger analysis",

abstract = "Artefacts due to surface topography are a common problem in Auger analysis. A Cylindrical Mirror Analyser (CMA) has been modified to aid the rapid identification of such artefacts. It uses three pairs of opposing detectors that observe 6 angles of azimuth simultaneously. The CMA also incorporates a new electrostatic lens between the cylinders and detector, which deflects electrons onto the detectors along the same path independent of their energy. The operation and characterisation of the modified CMA and the lens are described. Data from a microfabricated field electron emitter show the ability to identify artefacts from the true surface data.",

keywords = "Auger, CMA, electrostatic lens, topography, artefact identification",

author = "A Gelsthorpe and El-Gomati, {M M}",

year = "2001",

language = "English",

isbn = "0-7503-0812-5",

pages = "69--72",

editor = "M Aindow and CJ Kiely",

booktitle = "ELECTRON MICROSCOPY AND ANALYSIS 2001",

publisher = "IOP Publishing",

address = "United Kingdom",

note = "Conference of the Electron-Microscopy-and Analysis-Group ; Conference date: 05-09-2001 Through 07-09-2001",

}

TY - GEN

T1 - Identification of artefacts due to surface topography in Auger analysis

AU - Gelsthorpe, A

AU - El-Gomati, M M

PY - 2001

Y1 - 2001

N2 - Artefacts due to surface topography are a common problem in Auger analysis. A Cylindrical Mirror Analyser (CMA) has been modified to aid the rapid identification of such artefacts. It uses three pairs of opposing detectors that observe 6 angles of azimuth simultaneously. The CMA also incorporates a new electrostatic lens between the cylinders and detector, which deflects electrons onto the detectors along the same path independent of their energy. The operation and characterisation of the modified CMA and the lens are described. Data from a microfabricated field electron emitter show the ability to identify artefacts from the true surface data.

AB - Artefacts due to surface topography are a common problem in Auger analysis. A Cylindrical Mirror Analyser (CMA) has been modified to aid the rapid identification of such artefacts. It uses three pairs of opposing detectors that observe 6 angles of azimuth simultaneously. The CMA also incorporates a new electrostatic lens between the cylinders and detector, which deflects electrons onto the detectors along the same path independent of their energy. The operation and characterisation of the modified CMA and the lens are described. Data from a microfabricated field electron emitter show the ability to identify artefacts from the true surface data.

KW - Auger

KW - CMA

KW - electrostatic lens

KW - topography

KW - artefact identification

M3 - Conference contribution

SN - 0-7503-0812-5

SP - 69

EP - 72

BT - ELECTRON MICROSCOPY AND ANALYSIS 2001

A2 - Aindow, M

A2 - Kiely, CJ

PB - IOP Publishing

CY - BRISTOL

T2 - Conference of the Electron-Microscopy-and Analysis-Group

Y2 - 5 September 2001 through 7 September 2001

ER -