Laser structured micro-targets generate MeV electron temperature at 4 x10^16 W/cm^2

Angana Mondal, Ratul Sabui, Sheroy Tata, R.M.G.M. Trines, S. V. Rahul, Feiyu Li, Soubhik Sarkar, William Trickey, Rakesh Y. Kumar, Debobrata Rajak, John Pasley, Zhengming Sheng, J. Jha, M. Anand, Ram Gopal, A. P. L. Robinson, M. Krishnamurthy

Research output: Working paper


Relativistic temperature electrons higher than 0.5 MeV are generated typically with laser intensities of about 10^18 W/cm^2. Their generation with high repetition rate lasers that operate at non-relativistic intensities (~10^16W/cm^2) is cardinal for the realization of compact, ultra-short, bench-top electron sources. New strategies, capable of exploiting different aspects of laser-plasma interaction, are necessary for reducing the required intensity. We report here, a novel technique of dynamic target structuring of microdroplets, capable of generating 200 keV and 1 MeV electron temperatures at 1/100th of the intensity required by ponderomotive scaling(10^18 W/cm^2) to generate relativistic electron temperature. Combining the concepts of pre-plasma tailoring, optimized scale length and micro-optics, this method achieves two-plasmon decay boosted electron acceleration with "non-ideal" ultrashort (25 fs) pulses at 4 x10^16 W/cm^2 only. With shot repeatability at kHz, this precise in-situ targetry produces directed, imaging quality beam-like electron emission up to 6 MeV with milli-joule class lasers, that can be transformational for time-resolved, microscopic studies in all fields of science.
Original languageEnglish
Number of pages21
Publication statusPublished - 8 Jul 2021

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