Abstract
Single-walled carbon nanotubes are efficiently cut to precise submicrometer lengths and very narrow length distributions. Chemical functional groups are placed selectively only at the ends without the nanotube walls being modified or damaged. The new methodology includes lithography to place protective photoresist patterns over the nanotubes and reactive ion etching to remove the unprotected nanostructure. This approach enables critical dimensional and chemical control for integrated nanodevice manufacturing based on chemical self-assembly under ambient conditions.
Original language | English |
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Pages (from-to) | 1007-1012 |
Number of pages | 5 |
Journal | Nano Letters |
Volume | 3 |
Issue number | 8 |
DOIs | |
Publication status | Published - 2003 |