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Opacity effects on laser-produced plasma radiation sources

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JournalJournal of Applied Physics
DateAccepted/In press - 7 Aug 2019
DateE-pub ahead of print (current) - 23 Aug 2019
Volume126
Number of pages6
Early online date23/08/19
Original languageEnglish

Abstract

The escape of spectral line radiation from laser-produced plasma radiation sources with moderate opacity is examined using a simple model of emission with a planar geometry, constant source function, and an empirically determined optical depth. The model is applied to determine the radiation produced by laser irradiation of tin targets used as the source of radiation in extreme ultraviolet (EUV) lithography. Variations in emission relative to optically thin plasmas in agreement with previous experimental measurements of both the angular variation of the emission of EUV light at 13.5 nm and the effect of plasma opacity in reducing EUV emission at laser intensities above 10^11 W cm^-2 are found. The model is extended to predict optimum conditions for future lithography radiation sources at 6:7 nm.

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