Optimisation of photoresist removal from silicon wafers using atmospheric-pressure plasma jet effluent

Andrew West, Marc van der Schans, Cigang Xu, Timo Gans, Mike Cooke, Erik Wagenaars

Physics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Original language	English
Title of host publication	Proc 22nd ISPC
Number of pages	4
Publication status	Published - 2015

Access to Document

West_ISPCFinal published version, 303 KB

http://www.ispc-conference.org/ispcproc/ispc22/O-8-3.pdf

15th International Conference on Plasma Surface Engineering
Wagenaars, E. (Keynote/plenary speaker)
14 Sept 2016
Activity: Talk or presentation › Invited talk

Metrology concepts for a new generation of plasma manufacturing with atom-scale precision
Gans, T. (Principal investigator), O'Connell, D. (Co-investigator) & Wagenaars, E. (Co-investigator)
EPSRC
1/07/13 → 21/12/18
Project: Research project (funded) › Research

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