Optimisation of photoresist removal from silicon wafers using atmospheric-pressure plasma jet effluent

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Access to Document

15th International Conference on Plasma Surface Engineering
Wagenaars, E. (Keynote/plenary speaker)
14 Sept 2016
Activity: Talk or presentation › Invited talk

Metrology concepts for a new generation of plasma manufacturing with atom-scale precision
GANS, T. (Principal investigator), O'CONNELL, D. (Co-investigator) & Wagenaars, E. (Co-investigator)
EPSRC
1/07/13 → 21/12/18
Project: Research project (funded) › Research