Optimisation of photoresist removal from silicon wafers using atmospheric-pressure plasma jet effluent

Andrew West, Marc van der Schans, Cigang Xu, Timo Gans, Mike Cooke, Erik Wagenaars

Physics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 results

Finished

Metrology concepts for a new generation of plasma manufacturing with atom-scale precision
Gans, T. (Principal investigator), O'Connell, D. (Co-investigator) & Wagenaars, E. (Co-investigator)
EPSRC
1/07/13 → 21/12/18
Project: Research project (funded) › Research