Optimisation of photoresist removal from silicon wafers using atmospheric-pressure plasma jet effluent

Andrew West
, Marc van der Schans
, Cigang Xu
, Timo Gans
, Mike Cooke
, Erik Wagenaars

Physics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

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Metrology concepts for a new generation of plasma manufacturing with atom-scale precision
GANS, T. (Principal investigator), O'CONNELL, D. (Co-investigator) & Wagenaars, E. (Co-investigator)
EPSRC
1/07/13 → 21/12/18
Project: Research project (funded) › Research