Power scaling of an extreme ultraviolet light source for future lithography

Erik Wagenaars, Felix Kuepper, Juergen Klein, Willi Neff, Marcel Damen, Pieter van der Wel, Dominik Vaudrevange, Jeroen Jonkers

Research output: Contribution to journalArticlepeer-review


For future lithography applications, high-power extreme ultraviolet (EUV) light sources are needed at a central wavelength of 13.5 nm within 2% bandwidth. We have demonstrated that from a physics point of view the Philips alpha-prototype source concept is scalable up to the power levels required for high-volume manufacturing (HVM) purposes. Scalability is shown both in frequency, up to 100 kHz, and pulse energy, up to 55 mJ collectable EUV per pulse, which allows us to find an optimal working point for future HVM sources within a wide parameter space. (C) 2008 American Institute of Physics.

Original languageEnglish
Article number181501
Pages (from-to)1-3
Number of pages3
JournalApplied Physics Letters
Issue number18
Publication statusPublished - 5 May 2008

Bibliographical note

© 2008 American Institute Physics. This is an author produced version of a paper published in Applied Physics Letters. Uploaded in accordance with the publisher's self-archiving policy.

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