Power scaling of an extreme ultraviolet light source for future lithography

Erik Wagenaars; Felix Kuepper; Juergen Klein; Willi Neff; Marcel Damen; Pieter van der  Wel; Dominik Vaudrevange; Jeroen Jonkers

doi:10.1063/1.2924299

Power scaling of an extreme ultraviolet light source for future lithography

Erik Wagenaars, Felix Kuepper, Juergen Klein, Willi Neff, Marcel Damen, Pieter van der Wel, Dominik Vaudrevange, Jeroen Jonkers

Physics

Research output: Contribution to journal › Article › peer-review

Abstract

For future lithography applications, high-power extreme ultraviolet (EUV) light sources are needed at a central wavelength of 13.5 nm within 2% bandwidth. We have demonstrated that from a physics point of view the Philips alpha-prototype source concept is scalable up to the power levels required for high-volume manufacturing (HVM) purposes. Scalability is shown both in frequency, up to 100 kHz, and pulse energy, up to 55 mJ collectable EUV per pulse, which allows us to find an optimal working point for future HVM sources within a wide parameter space. (C) 2008 American Institute of Physics.

Original language	English
Article number	181501
Pages (from-to)	1-3
Number of pages	3
Journal	Applied Physics Letters
Volume	92
Issue number	18
DOIs	https://doi.org/10.1063/1.2924299
Publication status	Published - 5 May 2008

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AU - van der Wel, Pieter

AU - Vaudrevange, Dominik

AU - Jonkers, Jeroen

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Power scaling of an extreme ultraviolet light source for future lithography

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