Sn DPP source-collector modules: Status of Alpha sources, Beta developments and the scalability to HVM

Marc Corthout; Rolf Apetz; Jesko Brudermann; Marcel Damen; Günther Derra; Oliver Franken; Jeroen Jonkers; Jürgen Klein; Felix Küpper; Arnaud Mader; Willi Neff; Hans Scheuermann; Guido Schriever; Max Schürmann; Guido Siemons; Rob Snijkers; Dominik Vaudrevange; Erik Wagenaars; Pieter Van De Wei; Masaki Yoshioka; Peter Zink; Oliver Zitzen

doi:10.1117/12.772633

Sn DPP source-collector modules: Status of Alpha sources, Beta developments and the scalability to HVM

Marc Corthout^*, Rolf Apetz, Jesko Brudermann, Marcel Damen, Günther Derra, Oliver Franken, Jeroen Jonkers, Jürgen Klein, Felix Küpper, Arnaud Mader, Willi Neff, Hans Scheuermann, Guido Schriever, Max Schürmann, Guido Siemons, Rob Snijkers, Dominik Vaudrevange, Erik Wagenaars, Pieter Van De Wei, Masaki YoshiokaPeter Zink, Oliver Zitzen

^*Corresponding author for this work

Physics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

For industrial EUV (extreme ultra-violet) lithography applications high power extreme ultraviolet (EUV) light sources are needed at a central wavelength of 13.5 nm, targeting 32 nm node and below. Philips Extreme UV GmbH and XTREME technologies GmbH have developed DPP (Discharge Produced Plasma) Alpha tools which run in operation at several locations in the world. In this paper the status of the Alpha Sn-DPP tools as developed by Philips Extreme UV GmbH will be given. The Alpha DPP tools provide a good basis for the development and engineering of the Beta tools and in the future the HVM tools. The first Beta source has been designed and first light has been produced. Engineering steps will follow to optimize this first generation Beta Sn-DPP source. HVM tools target EUV power levels from 200W to 500W in IF. In this paper we show that the power required for HVM can be generated with Sn-DPP sources. Based on Alpha Sn-DPP sources we show that repetition frequency and generated EUV pulse energy is scalable up to power levels that match the HVM requirements.

Original language	English
Title of host publication	Proceedings of SPIE - The International Society for Optical Engineering
Volume	6921
DOIs	https://doi.org/10.1117/12.772633
Publication status	Published - 1 Dec 2008
Event	Emerging Lithographic Technologies XII - San Jose, CA, United Kingdom Duration: 26 Feb 2008 → 28 Feb 2008

Conference

Conference	Emerging Lithographic Technologies XII
Country/Territory	United Kingdom
City	San Jose, CA
Period	26/02/08 → 28/02/08

Keywords

DPP
EUV Lithography
EUV source
Gas discharge plasma
Tin

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10.1117/12.772633

Cite this

Corthout, M., Apetz, R., Brudermann, J., Damen, M., Derra, G., Franken, O., Jonkers, J., Klein, J., Küpper, F., Mader, A., Neff, W., Scheuermann, H., Schriever, G., Schürmann, M., Siemons, G., Snijkers, R., Vaudrevange, D., Wagenaars, E., Van De Wei, P., ... Zitzen, O. (2008). Sn DPP source-collector modules: Status of Alpha sources, Beta developments and the scalability to HVM. In Proceedings of SPIE - The International Society for Optical Engineering (Vol. 6921). Article 69210V https://doi.org/10.1117/12.772633

@inproceedings{18bd96c99c41488789ae790d7b98b652,

title = "Sn DPP source-collector modules: Status of Alpha sources, Beta developments and the scalability to HVM",

abstract = "For industrial EUV (extreme ultra-violet) lithography applications high power extreme ultraviolet (EUV) light sources are needed at a central wavelength of 13.5 nm, targeting 32 nm node and below. Philips Extreme UV GmbH and XTREME technologies GmbH have developed DPP (Discharge Produced Plasma) Alpha tools which run in operation at several locations in the world. In this paper the status of the Alpha Sn-DPP tools as developed by Philips Extreme UV GmbH will be given. The Alpha DPP tools provide a good basis for the development and engineering of the Beta tools and in the future the HVM tools. The first Beta source has been designed and first light has been produced. Engineering steps will follow to optimize this first generation Beta Sn-DPP source. HVM tools target EUV power levels from 200W to 500W in IF. In this paper we show that the power required for HVM can be generated with Sn-DPP sources. Based on Alpha Sn-DPP sources we show that repetition frequency and generated EUV pulse energy is scalable up to power levels that match the HVM requirements.",

keywords = "DPP, EUV Lithography, EUV source, Gas discharge plasma, Tin",

author = "Marc Corthout and Rolf Apetz and Jesko Brudermann and Marcel Damen and G{\"u}nther Derra and Oliver Franken and Jeroen Jonkers and J{\"u}rgen Klein and Felix K{\"u}pper and Arnaud Mader and Willi Neff and Hans Scheuermann and Guido Schriever and Max Sch{\"u}rmann and Guido Siemons and Rob Snijkers and Dominik Vaudrevange and Erik Wagenaars and {Van De Wei}, Pieter and Masaki Yoshioka and Peter Zink and Oliver Zitzen",

year = "2008",

month = dec,

day = "1",

doi = "10.1117/12.772633",

language = "English",

isbn = "9780819471062",

volume = "6921",

booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",

note = "Emerging Lithographic Technologies XII ; Conference date: 26-02-2008 Through 28-02-2008",

}

Corthout, M, Apetz, R, Brudermann, J, Damen, M, Derra, G, Franken, O, Jonkers, J, Klein, J, Küpper, F, Mader, A, Neff, W, Scheuermann, H, Schriever, G, Schürmann, M, Siemons, G, Snijkers, R, Vaudrevange, D, Wagenaars, E, Van De Wei, P, Yoshioka, M, Zink, P & Zitzen, O 2008, Sn DPP source-collector modules: Status of Alpha sources, Beta developments and the scalability to HVM. in Proceedings of SPIE - The International Society for Optical Engineering. vol. 6921, 69210V, Emerging Lithographic Technologies XII, San Jose, CA, United Kingdom, 26/02/08. https://doi.org/10.1117/12.772633

TY - GEN

T1 - Sn DPP source-collector modules

T2 - Emerging Lithographic Technologies XII

AU - Corthout, Marc

AU - Apetz, Rolf

AU - Brudermann, Jesko

AU - Damen, Marcel

AU - Derra, Günther

AU - Franken, Oliver

AU - Jonkers, Jeroen

AU - Klein, Jürgen

AU - Küpper, Felix

AU - Mader, Arnaud

AU - Neff, Willi

AU - Scheuermann, Hans

AU - Schriever, Guido

AU - Schürmann, Max

AU - Siemons, Guido

AU - Snijkers, Rob

AU - Vaudrevange, Dominik

AU - Wagenaars, Erik

AU - Van De Wei, Pieter

AU - Yoshioka, Masaki

AU - Zink, Peter

AU - Zitzen, Oliver

PY - 2008/12/1

Y1 - 2008/12/1

N2 - For industrial EUV (extreme ultra-violet) lithography applications high power extreme ultraviolet (EUV) light sources are needed at a central wavelength of 13.5 nm, targeting 32 nm node and below. Philips Extreme UV GmbH and XTREME technologies GmbH have developed DPP (Discharge Produced Plasma) Alpha tools which run in operation at several locations in the world. In this paper the status of the Alpha Sn-DPP tools as developed by Philips Extreme UV GmbH will be given. The Alpha DPP tools provide a good basis for the development and engineering of the Beta tools and in the future the HVM tools. The first Beta source has been designed and first light has been produced. Engineering steps will follow to optimize this first generation Beta Sn-DPP source. HVM tools target EUV power levels from 200W to 500W in IF. In this paper we show that the power required for HVM can be generated with Sn-DPP sources. Based on Alpha Sn-DPP sources we show that repetition frequency and generated EUV pulse energy is scalable up to power levels that match the HVM requirements.

AB - For industrial EUV (extreme ultra-violet) lithography applications high power extreme ultraviolet (EUV) light sources are needed at a central wavelength of 13.5 nm, targeting 32 nm node and below. Philips Extreme UV GmbH and XTREME technologies GmbH have developed DPP (Discharge Produced Plasma) Alpha tools which run in operation at several locations in the world. In this paper the status of the Alpha Sn-DPP tools as developed by Philips Extreme UV GmbH will be given. The Alpha DPP tools provide a good basis for the development and engineering of the Beta tools and in the future the HVM tools. The first Beta source has been designed and first light has been produced. Engineering steps will follow to optimize this first generation Beta Sn-DPP source. HVM tools target EUV power levels from 200W to 500W in IF. In this paper we show that the power required for HVM can be generated with Sn-DPP sources. Based on Alpha Sn-DPP sources we show that repetition frequency and generated EUV pulse energy is scalable up to power levels that match the HVM requirements.

KW - DPP

KW - EUV Lithography

KW - EUV source

KW - Gas discharge plasma

KW - Tin

UR - http://www.scopus.com/inward/record.url?scp=62449262244&partnerID=8YFLogxK

U2 - 10.1117/12.772633

DO - 10.1117/12.772633

M3 - Conference contribution

AN - SCOPUS:62449262244

SN - 9780819471062

VL - 6921

BT - Proceedings of SPIE - The International Society for Optical Engineering

Y2 - 26 February 2008 through 28 February 2008

ER -

Sn DPP source-collector modules: Status of Alpha sources, Beta developments and the scalability to HVM

Abstract

Conference

Keywords

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