TEMPERATURE, COMPOSITION AND MICROSTRUCTURE VARIATIONS DURING PULSED-LASER IRRADIATION OF A DEPOSITED FILM ON A SUBSTRATE

Research output: Contribution to journalArticle

Author(s)

  • I T H CHANG
  • B CANTOR

Department/unit(s)

Publication details

JournalActa metallurgica et materialia
DatePublished - Dec 1995
Issue number12
Volume43
Number of pages10
Pages (from-to)4411-4420
Original languageEnglish

Abstract

A computer model has been developed to describe melting and resolidification during laser irradiation of elemental and alloy films on a substrate. The computer model predicts the temperature profile, maximum melt depth, maximum solidification rate, onset of cellular breakdown and the final resolidified composition profile. The computer model has been compared with measurements [I. T. H. Chang and B. Cantor, J. Thin Solid Films 230, 167 (1993)] made on cross-section TEM specimens of 1.15 J/cm(2) irradiated 400 nm thick Sn and 0.96-1.17 J/cm(2) irradiated 120 Mm thick Ge-50 at.% Sn films on single crystal Ge substrates. The predicted results give good agreement with the measured data. The maximum melt depth increases with increasing laser energy density. Cellular breakdown takes place at increasing depth with increasing laser energy density.

Discover related content

Find related publications, people, projects, datasets and more using interactive charts.

View graph of relations