The role of the relative voltage and phase for frequency coupling in a dual-frequency capacitively coupled plasma

D. O'Connell; T. Gans; E. Semmler; P. Awakowicz

doi:10.1063/1.2972117

The role of the relative voltage and phase for frequency coupling in a dual-frequency capacitively coupled plasma

D. O'Connell, T. Gans, E. Semmler, P. Awakowicz

Physics

Research output: Contribution to journal › Article › peer-review

Abstract

Frequency coupling in multifrequency discharges is a complex nonlinear interaction of the different frequency components. An alpha-mode low pressure rf capacitively coupled plasma operated simultaneously with two frequencies is investigated and the coupling of the two frequencies is observed to greatly influence the excitation and ionization within the discharge. Through this, plasma production and sustainment are dictated by the corresponding electron dynamics and can be manipulated through the dual-frequency sheath. These mechanisms are influenced by the relative voltage and also the relative phase of the two frequencies. (C) 2008 American Institute of Physics.

Original language	English
Article number	081502
Pages (from-to)	1-3
Number of pages	3
Journal	Applied Physics Letters
Volume	93
Issue number	8
DOIs	https://doi.org/10.1063/1.2972117
Publication status	Published - 25 Aug 2008

Keywords

ELECTRIC-FIELDS
FUNCTIONAL SEPARATION
DISCHARGE
SHEATH
ENERGY

Access to Document

10.1063/1.2972117

http://apl.aip.org/resource/1/applab/v93/i8/p081502_s1

Cite this

@article{66f840552fd242219fb6a94e34dca91c,

title = "The role of the relative voltage and phase for frequency coupling in a dual-frequency capacitively coupled plasma",

abstract = "Frequency coupling in multifrequency discharges is a complex nonlinear interaction of the different frequency components. An alpha-mode low pressure rf capacitively coupled plasma operated simultaneously with two frequencies is investigated and the coupling of the two frequencies is observed to greatly influence the excitation and ionization within the discharge. Through this, plasma production and sustainment are dictated by the corresponding electron dynamics and can be manipulated through the dual-frequency sheath. These mechanisms are influenced by the relative voltage and also the relative phase of the two frequencies. (C) 2008 American Institute of Physics.",

keywords = "ELECTRIC-FIELDS, FUNCTIONAL SEPARATION, DISCHARGE, SHEATH, ENERGY",

author = "D. O'Connell and T. Gans and E. Semmler and P. Awakowicz",

year = "2008",

month = aug,

day = "25",

doi = "10.1063/1.2972117",

language = "English",

volume = "93",

pages = "1--3",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "8",

}

TY - JOUR

T1 - The role of the relative voltage and phase for frequency coupling in a dual-frequency capacitively coupled plasma

AU - O'Connell, D.

AU - Gans, T.

AU - Semmler, E.

AU - Awakowicz, P.

PY - 2008/8/25

Y1 - 2008/8/25

N2 - Frequency coupling in multifrequency discharges is a complex nonlinear interaction of the different frequency components. An alpha-mode low pressure rf capacitively coupled plasma operated simultaneously with two frequencies is investigated and the coupling of the two frequencies is observed to greatly influence the excitation and ionization within the discharge. Through this, plasma production and sustainment are dictated by the corresponding electron dynamics and can be manipulated through the dual-frequency sheath. These mechanisms are influenced by the relative voltage and also the relative phase of the two frequencies. (C) 2008 American Institute of Physics.

AB - Frequency coupling in multifrequency discharges is a complex nonlinear interaction of the different frequency components. An alpha-mode low pressure rf capacitively coupled plasma operated simultaneously with two frequencies is investigated and the coupling of the two frequencies is observed to greatly influence the excitation and ionization within the discharge. Through this, plasma production and sustainment are dictated by the corresponding electron dynamics and can be manipulated through the dual-frequency sheath. These mechanisms are influenced by the relative voltage and also the relative phase of the two frequencies. (C) 2008 American Institute of Physics.

KW - ELECTRIC-FIELDS

KW - FUNCTIONAL SEPARATION

KW - DISCHARGE

KW - SHEATH

KW - ENERGY

UR - http://www.scopus.com/inward/record.url?scp=51349139860&partnerID=8YFLogxK

U2 - 10.1063/1.2972117

DO - 10.1063/1.2972117

M3 - Article

SN - 0003-6951

VL - 93

SP - 1

EP - 3

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 8

M1 - 081502

ER -

The role of the relative voltage and phase for frequency coupling in a dual-frequency capacitively coupled plasma

Abstract

Keywords

Access to Document

Other files and links

Cite this