Abstract
Herein, a new heterostructured ultraviolet metal–semiconductor–metal photodetector based on Mg0.67Ni0.33O thin film and SrTiO3 is reported. The metal–semiconductor–metal photodetector comprises a 22 nm epilayer of Mg0.67Ni0.33O grown on SrTiO3 (111) substrate by molecular beam epitaxy. A comparison of responsivities of the Mg0.67Ni0.33O–SrTiO3 photodetector and reference SrTiO3 photodetector shows that the heterostructured detector has close to an order of magnitude enhanced responsivity in the deep-ultraviolet region. The responsivity of the Mg0.67Ni0.33–SrTiO3-based photodetector at 320 nm is 415 mA W−1, with dark current lower than 40 pA at a bias of 10 V. The rise and fall times of Mg0.67Ni0.33O–SrTiO3 photodetector are 10.7 and 8.6 ms, respectively, with the rise time more than two orders of magnitude shorter than the reference SrTiO3 photodetector.
Original language | English |
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Article number | 2000175 |
Number of pages | 5 |
Journal | Physica Status Solidi - Rapid Research Letters |
Early online date | 13 May 2020 |
DOIs | |
Publication status | E-pub ahead of print - 13 May 2020 |
Bibliographical note
© 2020 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim. This is an author-produced version of the published paper. Uploaded in accordance with the publisher’s self-archiving policy. Further copying may not be permitted; contact the publisher for details.Keywords
- deep ultraviolet
- MgNiO
- SrTiO
- thin films
- ultraviolet photodetectors